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Reactive Ion Etching System Reflectometer

Reactive Ion Etching System Reflectometer
company Cross-Tech Development CO., Limited
Categories Spectrometers
Update2010-12-30
Original RegionChina
Reactive Ion Etching System Reflectometer

Spectroscopic Reflectometer (Made in Germany)

Our Thin Film Measurement System is the ideal tool for fast, reliable and easy measurement of transparent and semi-transparent thin layers. Depending on the layer and substrate material it can measure layers of just a few nanometers up to several hundreds of microns.

The large spectral range available from 250nm (UV) to 1100nm (NIR), as well as our special simulation algorithms allow the measurement not only of standard samples like oxides, nitrides and resists on ideal substrates like silicon wafer or glass but also the measurement of critical layers like DLC (diamond like carbon) on metal, layers on unpolished steel plates or the thickness of transparent foils.
 
Applications
In general the our system can measure all layer thickness of transparent and semi-transparent layers on a defined substrate as long as we do get a interference signal caused by the reflection of light on the layer surface and bottom.
Here are some application which were measured successfully using our system:
-  Measurement of dielectric layers on wafer or glass
   (SiO2, Si3N4, Photo-resist, ITO, ...)
-  Extremely thin metal layers on wafer or glass (Ag, Al, Au, Ti, ...)
-  SOI silicon thickness measurement (Silicon On Isolator)
-  Thickness of thinned silicon wafer  (< 120m)
-  Resist homogeneity check on semiconductor masks
-  DVD/CD coating
-  Coatings on lenses (Hard- and Antireflection-Coating)
-  DLC (Diamond Like Carbon) hard-coatings
-  Thickness measurement of different foils
-  Air-gap measurement between mask and wafer in mask aligners
-  extremely thick resists in MEMS application (100m up to 250m)
-  Coating in bottles and injection syringe
-  Integration into existing coating and etch systems for on-line process control
-  And many, many more ...

Software Function
Our software is an easy-to-use production oriented software tool for the acquisition and analysis of spectroscopic data which allows the user to find solutions to a wide range of applications. Software enables thickness measurements from 10 nm up to about 250 m.The system only needs the knowledge of number and kind of the compound thin films. Single layer and multi-layer systems with estimated thickness can be calculated in less than one second. Therefore it is also possible to apply a two-dimensional scanning scheme. The user mode is specifically designed such for little or no experience in personal computers.In the administrator mode, the administrator specifies the recipe settings. Each recipe contains the layer and material settings and instrument parameter settings.


Hardware Setup

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